Organizing Committee

K. J. Kim (Chair, KRISS, Korea)

K. Yanagiuchi (Chair, TDK, Japan)

J. P. Ahn (KIST, Korea)

J. M. Yang (NNFC, Korea)

S. Y. Park (Semilab, Korea)

S. R. Lee (LGD, Korea)

Y. H. Lee (KIST, Korea)

H. G. Shin (POSTECH, Korea)

S. J. Cho (Park Systems, Korea)

S. D. Cho (Surface Systems Korea, Korea)

W. J. Yoon (ThermoFisher Scientific, Korea)

J. Lee (KBSI, Korea)

Y. Park (Kyung HeeUniv., Korea)

C. W. Yang (SungkyunkwanUniv., Korea)

C. S. Jeon (Samsung Electronics, Korea)

Y. Abe (Mitsubishi Chem., Japan)

D. Fujita (JSCA, Japan)

Y. Homma (Tokyo Univ. of Sci., Japan)

S. Ichimura (WasedaUniv., Japan)

K. Miura (NIMS, Japan)

M. Suzuki (SA consul., Japan)

S. Suzuki (Tohoku Univ., Japan)

S. Tanuma (NIMS, Japan)

K. Yoshihara (NIMS, Japan)

Steering Committee

J. P. Ahn (Chair, KIST, Korea)

H. Makino (Chair, Kochi Univ. of Technology, Japan)

Program Committee

J. S. Bae (Chair, KBSI, Korea)

T. Nagatomi (Chair, Asahi-Kasei, Japan)

Publication Committee

S. Park (Chair, Pusan National Univ., Korea)

N. Sanada (Chair, ULVAC-PHI, Japan)

International Advisory Board

D.R. Baer (Pacific Northwest Nat. Lab., USA)

Z. Ding (Univ. Sci. and Tech. of China, China)

A. Herrera-Gomez (CINVESTAV, Mexico)

A. Jablonski (Polish Academy of Science, Poland)

A. Shard (National Physical Laboratory, United Kingdom)

A. Thissen (SPECS Surface Nano Analysis GmbH, Germany)

S. Tougaard (Univ. Southern Denmark, Denmark)