The scope of this series of international symposia on the surface chemical analysis covers present status and future prospect of the surface analytical techniques in various practical and fundamental fields. Special emphasis on the actual problems is called, which have been arisen from the application of surface analytical technique such as Auger Electron Spectroscopy (AES), X-ray Photoelectron Spectroscopy (XPS), Electron Probe Micro-Analysis (EPMA), Secondary Ion Mass Spectrometry (SIMS) and Scanning Probe Microscope (SPM) for the variety of practical materials. The common problems for these techniques of reference materials, the depth profiling (3-D analysis), the beam damage (electrons, X-rays, and ions), pre-standards and international standards (ISO) are closely connected.
Topical sessions which would address important issues arising from the practical applications will also be scheduled. Fundamental researches for the improvements of the surface analytical techniques and development of noble methodologies to meet challenges from rapidly evolving nano and bio technology are also within the scope of this symposium. The education of young researches is also an important aim of PSA-24.